
Laser ablation technology helps the engineer to develop circuit carriers which cannot be manufactured with chemical etching technology. This kind of product results from combining the technologies of precision-grinding of ceramics and laser ablation of metallised thin-film layers. We name this concept "three-dimensional interconnection circuit or CI3D".
The laser structuring consist to etch directly a metallization layer deposited on a ceramic carrier with a laser beam without using a mask. This is called laser micromachining or laser ablation - because metal is ablated.
Laser ablation allows patterns to be etched directly on the ceramics substrate, very rapidly and beam displacements to be programmed limitless.
Although the laser ablation allows to structure flat substrates, this is specially a technology to achieve uninterrupted paths over several planes of a three-dimensional carrier. For instance, it allows to reach two metallised areas located on different heights by changing the focal plane or achieve a continuous track around a cylinder.
The only required tooling is a jig for holding the part. As a consequence, costs and lead times for setting-up and masks are reduced and thus making the process of interest for fast prototyping.
This technology offers the following advantages :
A « circuit carrier » is therefore made available to the final user who can bond onto his microelectronics components – sensor, calculator, chip, LED…- according to his own interconnection pattern. The demand for such products results from either the need to have mechanical and electrical functions together on a same carrier.